Method of fabricating nanodevices

Details Method of fabricating nanodevices Method of fabricating nanodevices

2006-02-28

2009-06-09

Vu, David (Department: 2818)

Semiconductor device manufacturing: process

Electron emitter manufacture

C438S460000, C438S462000, C438S962000, C977S742000, C977S750000, C977S752000, C977S773000, C977S745000, C977S748000, C977S856000, C977S857000, C313S309000, C313S311000, C313S310000, C257SE39001, C257SE39002, C257SE51038, C257SE51040, C257SE29096, C445S050000, C445S051000

Reexamination Certificate

active

07544523

ABSTRACT:
A method of batch fabrication using established photolithographic techniques allowing nanoparticles or nanodevices to be fabricated and mounted into a macroscopic device in a repeatable, reliable manner suitable for large-scale mass production. Nanoparticles can be grown on macroscopic “modules” which can be easily manipulated and shaped to fit standard mounts in various devices.

REFERENCES:
patent: 4055780 (1977-10-01), Kawai et al.
patent: 4482839 (1984-11-01), Wada et al.
patent: 6074896 (2000-06-01), Dando
patent: 6346189 (2002-02-01), Dui et al.
patent: 6401526 (2002-06-01), Dai et al.
patent: 6838297 (2005-01-01), Iwasaki et al.
patent: 6858521 (2005-02-01), Jin
patent: 6960528 (2005-11-01), Chen et al.
patent: 7094679 (2006-08-01), Li et al.
patent: 7276389 (2007-10-01), Kim et al.
patent: 2002/0006489 (2002-01-01), Goth et al.
patent: 2002/0024279 (2002-02-01), Simpson et al.
patent: 2002/0067489 (2002-06-01), Thakur et al.
patent: 2002/0084410 (2002-07-01), Colbert et al.
patent: 2004/0026629 (2004-02-01), Fujieda et al.
patent: 2004/0036403 (2004-02-01), Ono et al.
patent: 2004/0043527 (2004-03-01), Bradley et al.
patent: 2004/0241896 (2004-12-01), Zhou et al.
patent: 2006/0076489 (2006-04-01), Ohshima et al.
patent: 2007/0224804 (2007-09-01), Tiano et al.
patent: 2007/0256929 (2007-11-01), Pinheiro
patent: 2002097004 (2002-04-01), None
patent: 2007018542 (2007-02-01), None
patent: WO2007018542 (2007-02-01), None
patent: WO 2007018542 (2007-02-01), None
Refractory Materials & Electron Sources Applied Physics Technologies.
De Jonge: “Carbon Nanotube Electron Sources and Applications”; Phll. Trans. R. Soc. Lond.; A362; 2004; pp. 2239-2266.
Schwoebel; “Spindt Cathode Tip Processing to Enhance Emission Stability and High-Current Performance”; J. VacScl, Technol.; B21(1); Jan./Feb. 2003; pp. 433-435.
Yenlimez; “Wafer Scale Production of Carbon Nanotube Scanning Probe Tips for Atomic Force Microscopy”; Applied Physics Letters; vol. 80, No. 12; Mar. 25, 2002; pp. 2225-2227.
Teo; “Field Emission from Dense, Sparse, and Patterned Arrays of Carbon Nanofibers”; Applied Physics Letters; vol. 80, No. 11; Mar. 18, 2002; pp. 2011-2013.
Guillorn; “Operation of a Gated Field Emiter Using an Individual Carbon Nanofiber Cathode”: Applied Physics Letters; vol. 79, No. 21; Nov. 19, 2001; pp. 3508-2508.
Wang; “Flat Panel Display Prototype Using Gated Carbon Nanotube Field Emitters”; Applied Physics Letters: vol. 78, No. 9; Feb. 26, 2001; pp. 1294-1296.
Ren; “Growth of a Single Frestanding Multiwall Carbon Nanotube on Each Nanonickel Dot”: Applied Physics Letters; vol. 75, No. 823: Aug. 1999; pp. 1086-1088.

Affiliated with

Also associated with

Rating

Method of fabricating nanodevices does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of fabricating nanodevices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of fabricating nanodevices will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4141259