Method of fabricating electrodes with narrow gap therebetween

Details Method of fabricating electrodes with narrow gap therebetween Method of fabricating electrodes with narrow gap therebetween

1980-01-24

1981-06-23

Newsome, John H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

427 541, 427 431, 427DIG20N, B05D 306

Patent

active

042751446

ABSTRACT:
High speed, integrated optical directional coupler modulators utilize spaces of the order of one micron between waveguides. While one micron delineation of the waveguides can be readily obtained using conformable mask exposure techniques, diffraction effects become significant using thick glass masks required to delineate the electrodes. To overcome this problem, a two-process electrode fabrication procedure is employed. In accordance with the procedure a first pair of electrodes are deposited by a lithographic process. However, this yields a gap between electrodes that is wider than the desired gap. To reduce this distance, the process is repeated with the gap forming region of the mask laterally displaced. The result yields an electrode pattern with the desired spacing and thickness.

REFERENCES:
patent: 4155627 (1979-05-01), Gale et al.

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