Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2007-05-08
2007-05-08
Chambliss, Alonzo (Department: 2814)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C257S784000, C228S180500
Reexamination Certificate
active
10798053
ABSTRACT:
The invention provides a wire bond bonding a wire to a connection pad of an electronic device, and a method of forming the wire bond. A first stitch bond is formed on the connection pad, and a second stitch bond is next formed on the connection pad that is contiguous with the first stitch bond.
REFERENCES:
patent: 4415115 (1983-11-01), James
patent: 6426563 (2002-07-01), Fujihira
patent: 6583483 (2003-06-01), Masumoto et al.
patent: 6602778 (2003-08-01), Manning et al.
patent: 6774494 (2004-08-01), Arakawa
patent: 6815836 (2004-11-01), Ano
patent: 7064433 (2006-06-01), Wong et al.
patent: 2003/0230796 (2003-12-01), Ismail et al.
Liu Wei
Shen Zuo Cheng
Siew Chee Wai
Wong Yam Mo
ASM Technology Singapore Pte Ltd.
Chambliss Alonzo
Ostrolenk Faber Gerb & Soffen, LLP
LandOfFree
Method of fabricating a wire bond with multiple stitch bonds does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of fabricating a wire bond with multiple stitch bonds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of fabricating a wire bond with multiple stitch bonds will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3733791