Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Reexamination Certificate
2006-02-07
2006-02-07
McPherson, John A. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
C430S321000, C430S330000
Reexamination Certificate
active
06994951
ABSTRACT:
First, a substrate is provided, and a half-tone mask is employed to perform an exposing and developing process for forming a plurality of photoresist patterns having different thickness. Then, a flow process is performed to heat the photoresist patterns so that each photoresist pattern has a microlens surface. Following that, a metal plate is formed on the substrate for obtaining a plurality of patterns, which are opposite to the plurality of photoresist patterns, on the bottom surface. Finally, the metal plate is removed from the substrate, and combined with an insert mold.
REFERENCES:
patent: 6071652 (2000-06-01), Feldman et al.
patent: 2003/0209819 (2003-11-01), Brown et al.
patent: 0 475 741 (1992-03-01), None
patent: 7-323428 (1995-12-01), None
Chen Irene
Chou Tien-Yu
Hsu Chuan-Lun
Lay Jyh-Huei
Wang Yuan-Hung
McPherson John A.
U-Tech Media Corp.
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