Method of fabricating a semiconductor device by doping...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

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C438S164000, C438S479000, C438S514000, C438S517000

Reexamination Certificate

active

11013516

ABSTRACT:
One aspect of the present invention is forming a gate electrode over a semiconductor layer; doping the semiconductor layer with an impurity through the gate electrode in the first doping and without passing through the gate electrode in the second doping. Since two kinds of n31-type impurity regions are formed in the semiconductor layer, an off current can be reduced, and deterioration of characteristics can be suppressed.

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