Method of fabricating a pellicle cover for projection printing s

Details Method of fabricating a pellicle cover for projection printing s Method of fabricating a pellicle cover for projection printing s

1983-02-14

1984-08-14

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430323, 430324, 430330, 355 18, G03C 500

Patent

active

044657595

ABSTRACT:
The invention is directed to a method of fabricating a pellicle cover assembly for use in a projection printing system for forming an image on a radiation sensitive wafer, the method comprising the steps of applying a gold film onto the surface of a wafer, applying a polymer film onto the gold film surface, curing the polymer film, adhering a support ring to the polymer film, cutting through the polymer and gold films between the ring and wafer edges to expose the wafer surface, peeling the ring off the wafer and etching off the gold film.

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patent: 3892973 (1975-07-01), Coquin et al.
patent: 4037111 (1977-07-01), Coquin et al.
patent: 4063812 (1977-12-01), Abraham et al.
patent: 4131368 (1978-12-01), Shea et al.
patent: 4246054 (1981-01-01), Nester
Ron Hershel, SPIE, vol. 275, Semiconductor Micro-lithography VI, 1981, pp. 23-28.

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