Method of fabricating a field emission display device having a s

Electric lamp or space discharge component or device manufacturi – Process – With assembly or disassembly

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445 50, H01J 902

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active

059646292

ABSTRACT:
To form a silicon tip having an undercut, a photoresist pattern having a vertical profile or a positive profile is formed on a silicon substrate and an under-cuted isotropic etching process is then performed using the photoresist pattern as a mask. First and second insulation films are formed on the silicon tip and the silicon substrate except for the silicon tip. The first insulation film is then separated from the second insulation film.

REFERENCES:
patent: 5316511 (1994-05-01), Lee
patent: 5643032 (1997-07-01), Cheng et al.

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