Method of fabricating a display device by using a stepped...

Details Method of fabricating a display device by using a stepped... Method of fabricating a display device by using a stepped...

2005-12-21

2009-11-10

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S319000, C430S005000

Reexamination Certificate

active

07615336

ABSTRACT:
The present application relates to a method of fabricating a display device, including the steps of forming at least one to-be-patterned material layer on a substrate and forming a photo-resist layer on the at least one to-be-patterned material layer, providing a halftone mask including light transmission parts for transmitting light, shielding parts, in which shielding patterns for intercepting the light are formed, and a halftone transmission part, in which a first halftone transmission pattern for transmitting an amount of the light that is less than an amount of an incident light and a second halftone transmission pattern formed on the first halftone transmission pattern for transmitting an amount of the light that is less than the amount of the incident light are formed, exposing the photo-resist layer to the light through the halftone mask, developing the photo-resist layer to form a photo-resist pattern on the at least one to-be-patterned material layer on the subststrate, wherein the photo-resist pattern has three different heights, and patterning the at least one to-be-patterned material layer by an etching process and an ashing process using the photo-resist pattern, and wherein a width of the second halftone transmission pattern is narrower than a width of the first halftone transmission pattern.

REFERENCES:
patent: 6391499 (2002-05-01), Kim et al.
patent: 2003/0190556 (2003-10-01), Nakashima et al.
patent: 1 152 292 (2004-08-01), None
patent: 2005-24730 (2005-01-01), None
patent: 10 2005 0016704 (2005-02-01), None

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