Method of fabricating a contoured slider surface feature with a

Details Method of fabricating a contoured slider surface feature with a Method of fabricating a contoured slider surface feature with a

1996-08-09

1998-12-29

Nuzzolillo, M.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430396, 216 22, 216 41, 216 58, 296302, 2963018, 2963015, 2963012, G03C 500

Patent

active

058539590

ABSTRACT:
A method of fabricating a contoured surface feature to multiple depths on a surface of a hydrodynamic bearing slider with a single mask includes applying a lithographic resist layer to the slider surface and forming the single mask with a mask pattern which includes a masked area, an unmasked area and an intermediate area between the masked area and the unmasked area. The lithographic resist layer is then exposed through the single mask and removed as a function of exposure to form a patterned resist layer and to thereby uncover portions of the slider surface within the patterned resist layer. The uncovered portions of the slider surface and the patterned resist layer are etched, with the uncovered portions being etched to a first depth below the slider surface. The multiple depth surface feature is created by providing the intermediate mask area with a geometry of masked and unmasked features that is unresolvable by one of the steps of exposing an etching such that an area of the slider surface corresponding to the intermediate mask area is etched to a second depth which is less than the first depth.

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patent: 5509554 (1996-04-01), Samuelson et al.
patent: 5626941 (1997-05-01), Ouano

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