Method of exposure of chemically machineable light-sensitive gla

Details Method of exposure of chemically machineable light-sensitive gla Method of exposure of chemically machineable light-sensitive gla

1982-06-01

1983-06-28

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156643, 156644, 156654, 156663, 2504921, 430321, B44C 122, C03C 1500, C03C 2506

Patent

active

043903916

ABSTRACT:
A method for irradiating a chemically machinable light-sensitive glass plate with a parallel bundle of ultraviolet rays so as to form a tappered polygonal hole in the glass plate. A mask having a regular polygonal opening having n vertexes is mounted on a machinable light-sensitive glass plate and a light source capable of generating a parallel bundle of ultraviolet is disposed so that one of the vertexes of the polygonal opening is positioned at the longest point from the center of the light source. The glass plate is then irradiated. Thereafter, the light source is rotated about a center axis of the opening by an angle equal to 360.degree.
and the glass plate is re-irradiated. This procedure is conducted so that the glass plate is irradiated n times.

REFERENCES:
patent: 2628160 (1953-02-01), Stookey
patent: 4276335 (1981-06-01), Lemmond

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