Method of exposing thermoresist

Details Method of exposing thermoresist Method of exposing thermoresist

1998-06-05

2000-10-24

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430330, 430394, 430397, 430945, G03F 726

Patent

active

061365092

ABSTRACT:
Low contrast optics, including low contrast linear light valves, can be used to create high resolution patterns by using thermoresist instead of photoresist and by using multiple exposures of the same area, preferably exposing different features of the pattern in each exposure. When using thermoresist, the stray light from imaging the individual features does not add up, as the stray heat it creates will dissipate between exposures. The method is particularly useful for imaging thermoresists using UV light for manufacturing of integrated circuits.

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