Method of exposing substrate with one polarization mask and...

Details Method of exposing substrate with one polarization mask and... Method of exposing substrate with one polarization mask and...

2007-07-09

2010-11-09

Glick, Edward J (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S077000

Reexamination Certificate

active

07830496

ABSTRACT:
In a method of exposing a substrate to light and an apparatus for performing the method, a first optical unit configured to generate at least two lights and including a photomask, the at least two lights having pattern information of the photomask, and a second optical unit configured to direct the at least two lights along different paths and onto a substrate.

REFERENCES:
patent: 5245470 (1993-09-01), Keum
patent: 2005/0105180 (2005-05-01), Mackey
patent: 2005/0286035 (2005-12-01), Troost et al.
patent: 2007/0242254 (2007-10-01), Nagasaka
patent: 10-232497 (1998-09-01), None
patent: 20-0296805 (2002-11-01), None
patent: 1020030076213 (2003-09-01), None

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