Method of exposing and heating a light-sensitive material compri

Details Method of exposing and heating a light-sensitive material compri Method of exposing and heating a light-sensitive material compri

1990-10-31

1992-06-16

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Including heating

430270, 430271, 430281, 430523, G03C 17

Patent

active

051224437

ABSTRACT:
A light-sensitive material contains silver halide, a reducing agent, an ethylenically unsaturated polymerizable compound or/and a cross-linkable polymer, and a base or/and a base precursor. According to the present invention, the light-sensitive material comprises a support, a polymerizable layer and a light-sensitive layer in the order. The polymerizable layer contains the ethylenically unsaturated polymerizable compound or/and the cross-linkable polymer. The light-sensitive layer contains silver halide, and a base or/and a base precursor. The reducing agent is contained in the polymerizable layer or/and the light-sensitive layer. A protective layer is preferably provided on the light-sensitive layer. The light-sensitive material of the present invention is heat-developable. The present invention is based on a new discovery that a light-sensitive material comprising a polymerizable layer and a light-sensitive layer can be developed by heat. An image forming method using the light-sensitive material is also disclosed.

REFERENCES:
patent: 4885224 (1989-12-01), Yamamoto et al.
patent: 4933256 (1990-06-01), Kakimi
patent: 4945025 (1990-07-01), Nakamuka

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