X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1993-01-29
1993-12-21
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 71, G01N 2320
Patent
active
052727467
ABSTRACT:
A method of evaluating the degree of fatigue in a material to be inspected before the occurrence of a microcrack from data measured nondestructively through the measurement of diffracted beams of X-rays. A fatigue test is performed by applying a predetermined class of repeating stress predicted in a service environment of the material to be inspected to a reference piece of a quality corresponding to the material. A diffracted X-ray measurement is performed on the reference piece at a plurality of points of time during the fatigue test so that in accordance with the measurement results a fatigue characteristic curve is obtained which corresponds to the relation between the integrated amounts of the repeating stress and the intensities of the diffracted beams of X-rays. The diffracted X-ray measurement on a measuring portion of the material to be inspected is effected at each of at least two points of time in a service environment and the rate of change between the measured diffracted X-ray beam intensities is compared with the fatigue characteristic curve. In this way, the degree of fatigue in the material to be inspected as well as its remaining life up to the point of fatigue failure are obtained.
REFERENCES:
patent: 4404682 (1983-09-01), Hayashi et al.
patent: 4709383 (1987-11-01), Goto et al.
Aoki Kazuhiko
Isobe Yoshihiro
Kamimura Atsushi
Genshi Nenryo Kogyo Kabushiki Kaisha
Porta David P.
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