Method of etching zirconium diboride

Details Method of etching zirconium diboride Method of etching zirconium diboride

1988-03-31

1989-03-07

Terapane, John F.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

B44C 122

Patent

active

H00005975

ABSTRACT:
A thin film of zirconium diboride that has been deposited onto a substrate nd patterned using photolithography is dry etched in a commercial plasma etcher with either chloride gas, or a mixture of a chloride gas with oxygen, or a mixture of a chloride gas with nitrogen, or a mixture of chloride gas with a noble gas, or a fluoride gas, or a mixture of a fluoride gas with oxygen, or a mixture of a fluoride gas with nitrogen, or a mixture of a fluoride gas with a noble gas.

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