Method of etching titanium diboride

Details Method of etching titanium diboride Method of etching titanium diboride

1988-02-16

1989-03-07

Terapane, John F.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

B44C 122

Patent

active

H00005967

ABSTRACT:
A thin film of titanium diboride that has been deposited onto a substrate d patterned using photolithography is dry etched in a commercial plasma etcher with either a chloride, or a mixture of a chloride gas with oxygen, or a mixture of a chloride gas with nitrogen, or a mixture of a chloride gas with a noble gas, or a fluoride gas, or a mixture of a fluoride gas with oxygen, or a mixture of a fluoride gas with nitrogen, or a mixture of a fluoride gas with a noble gas.

REFERENCES:
patent: 4203800 (1986-05-01), Kitcher et al.
patent: 4229247 (1986-10-01), Chiu et al.
patent: 4440841 (1984-04-01), Tabuchi
patent: 4473436 (1984-09-01), Beinvogl
patent: 4635343 (1987-01-01), Kuroda
patent: 4647339 (1987-03-01), Houghton
patent: 4668335 (1987-05-01), Mockler et al.
patent: 4680086 (1987-07-01), Thomas et al.
patent: 4734157 (1988-03-01), Carbaugh et al.

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