Method of etching thin indium tin oxide films

Details Method of etching thin indium tin oxide films Method of etching thin indium tin oxide films

1988-12-22

1989-11-07

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156652, 156655, 156656, 1566591, 156667, 20419235, 252 791, B44C 122, C03C 1500, C03C 2506, C23F 102

Patent

active

048789933

ABSTRACT:
A thin layer of indium tin oxide is deposited on a substrate and etched by ion reactive etching with a plasma consisting of disassociated argon.

REFERENCES:
patent: 3957609 (1976-05-01), Sasano et al.
patent: 3979240 (1976-04-01), Ghezzo
patent: 4132614 (1979-01-01), Cuomo et al.
patent: 4153529 (1979-05-01), Little et al.
patent: 4160045 (1979-07-01), Longshore
patent: 4620898 (1986-11-01), Banks et al.
patent: 4778562 (1988-10-01), Chang

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