Method of etching silicon and polysilicon substrates

Details Method of etching silicon and polysilicon substrates Method of etching silicon and polysilicon substrates

1981-08-28

1982-12-21

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156657, 156662, 204192E, 252 791, H01L 21306, B44C 122, C03C 1500

Patent

active

043647936

ABSTRACT:
A method for etching silicon or polysilicon substrates wherein the substrates are exposed to a plasma formed by a conventional etchant enhanced by a metal halide.

REFERENCES:
patent: 3679502 (1972-07-01), Hays
patent: 3971684 (1976-07-01), Muto
patent: 4069096 (1978-01-01), Reinberg
patent: 4094732 (1978-06-01), Reinberg
patent: 4214946 (1980-07-01), Forget et al.
patent: 4255230 (1981-03-01), Zajac
patent: 4314875 (1982-02-01), Flamm

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