Method of etching polymethyl methacrylate

Details Method of etching polymethyl methacrylate Method of etching polymethyl methacrylate

1981-08-21

1982-11-23

Powell, William A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

1566591, 156668, 252 791, 427 431, 430435, B44C 122, C03C 1500, C03C 2506

Patent

active

043605850

ABSTRACT:
A method is described for forming a desired pattern in a layer of polymethyl methacrylate resist formed on a substrate by irradiating the layer with a pattern of radiation substantially identical to the desired pattern and thereafter immersing the layer of polymethyl methacrylate in a solution of acetone to remove the irradiated portion of the layer of polymethyl methacrylate.

REFERENCES:
patent: 4051271 (1977-09-01), Fujishige

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