Method of etching polyimide

Details Method of etching polyimide Method of etching polyimide

1993-05-03

1994-09-27

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156637, 156639, 156668, 252 795, B44C 122, B29C 3700

Patent

active

053504879

ABSTRACT:
The present invention relates to methods of etching polyimide from a substrate and to the etched substrates prepared according to such methods. In one embodiment, the present invention provides a method of etching polyimide from a substrate, comprising the steps of: providing a basic bath; ultrasonically agitating said basic bath; exposing said substrate containing polyimide to said basic bath; rinsing said substrate with hot water; optionally repeating the aforementioned steps at least once; and recovering an etched substrate. In another embodiment, the present invention provides a method of etching polyimide from a substrate, comprising the steps of: providing a basic bath; exposing said substrate containing polyimide to said basic bath; rinsing said substrate with hot water; maintaining the high loading capacity of said basic bath after exposure of polyimide to said basic bath, comprising cooling at least a portion of said basic bath thereby precipitating particles and separating the particles from said basic bath prior to reuse of said basic bath; and recovering an etched substrate.

REFERENCES:
patent: 3400027 (1968-09-01), Radimer et al.
patent: 3791848 (1974-02-01), De Angelo
patent: 3833436 (1974-09-01), Hillis et al.
patent: 4426253 (1984-01-01), Kreuz et al.
patent: 4428796 (1984-01-01), Milgram
patent: 4563242 (1986-01-01), Shigemitsu
patent: 4647345 (1987-03-01), Polan
patent: 4846929 (1989-07-01), Bard et al.
patent: 4857143 (1989-08-01), Glenning et al.
patent: 4878991 (1989-11-01), Eichelberger et al.
patent: 4911786 (1990-03-01), Kindl et al.
patent: 4959121 (1990-09-01), Dumas et al.
patent: 4960491 (1990-10-01), Youlton
patent: 4976808 (1990-12-01), Ogasawara

Affiliated with

Also associated with

Rating

Method of etching polyimide does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of etching polyimide, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of etching polyimide will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1263780