Method of etching materials including a major constituent of tin

Details Method of etching materials including a major constituent of tin Method of etching materials including a major constituent of tin

1976-04-12

1977-08-09

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

96 362, 252 792, C23F 102

Patent

active

040408922

ABSTRACT:
A method of etching a desired pattern in a layer of material including a major constituent of tin oxide is provided. A film of material which is resistant to the etching action of hot concentrated hydroiodic acid is formed on the layer and patterned. Portions of the layer uncovered by the patterned film are etched with hot concentrated hydroiodic acid.

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patent: 3979240 (1976-09-01), Ghezzo
Caley, The Action of Hydriodic Acid on Stannic Oxide, Journal of American Chemical Society, vol. 54, pp. 3240-3243, 1932.
Dyer, Hl-H.sub.2 Vapor Etch for Low Temperature Silicon Epitaxial Manufacturing, AICHE. Journal, vol. 18, No. 4, pp. 728-734.

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