Method of etching in the presence of positive photoresist

Details Method of etching in the presence of positive photoresist Method of etching in the presence of positive photoresist

1987-06-01

1990-07-10

Lacey, David L.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156654, 1566591, 156664, 252 745, C23F 100, B44C 122

Patent

active

049405101

ABSTRACT:
A wet chemical etchant for etching chromium films that have been patterned with positive photoresist comprising about 3 to about 9 grams potassium hydroxide per liter of water and about 15 to about 25 grams potassium permanganate per liter of water.

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Vossen and Kern, Thin Film Processes, Academic Press, New York, N.Y., 1978, p. 408.

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