Method of ensuring flatness of a vane in a headbox by means...

Paper making and fiber liberation – Processes and products – Running or indefinite length work forming and/or treating...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C162S336000, C162S343000, C162S208000

Reexamination Certificate

active

10999480

ABSTRACT:
A method of ensuring the flatness of a vane that is mounted in a headbox by means of a mounting arrangement including engagement dowels for cooperation with a downstream support wall of a transverse groove, said vane being affected during operation by shearing forces from the stock and by retaining forces from the mounting arrangement. In accordance with the invention outer engagement dowels are mounted at the side edges of the vane to cooperate during a specific period of time, as the only engagement dowels with the downstream support wall in order to take up said shearing forces, whereby tensile stresses will arise in the downstream end portion of the vane in the cross machine direction. The invention also relates to a headbox having such a mounting arrangement and the mounting arrangement per se in which the vane within and downstream of an inner area of the upstream end portion of the vane is arranged to move freely in the machine direction in relation to said downstream support wall during said period of time.

REFERENCES:
patent: 6165324 (2000-12-01), Linden

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of ensuring flatness of a vane in a headbox by means... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of ensuring flatness of a vane in a headbox by means..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of ensuring flatness of a vane in a headbox by means... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3790253

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.