Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Reexamination Certificate
2005-03-01
2005-03-01
Padgett, Marianne (Department: 1762)
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
C427S579000, C427S255180, C427S255270, C427S255370, C427S255393, C427S255394, C438S791000, C438S792000, C438S763000, C438S771000, C438S719000, C438S723000, C438S724000
Reexamination Certificate
active
06861104
ABSTRACT:
A method of enhancing adhesion strength of a boro-silicate glass (BSG) film to a silicon nitride film is provided. A semiconductor substrate with a silicon nitride film formed thereon is provided. The silicon nitride film is then exposed to oxygen-containing plasma such as ozone plasma. A thick BSG film is then deposited onto the treated surface of the silicon nitride film. By pre-treating the silicon nitride film with ozone plasma for about 60 seconds, an increase of near 50% of Kapp of the BSG film is obtained.
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Fang Yu-Wen
Tsai Cheng-Yuan
Wu Hsin-Chang
Yang Neng-Hui
Hsu Winston
Padgett Marianne
United Microelectronics Corp.
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