Method of dry etching aluminum

Details Method of dry etching aluminum Method of dry etching aluminum

1988-03-28

1989-01-17

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156656, 1566591, 156665, 156345, 20419235, C23F 102, B44C 122, C03C 1500, C03C 2506

Patent

active

047986506

ABSTRACT:
A method of reactive ion etching (RIE) of aluminum or an alloy thereof (Al) in which a substrate with an Al layer coated thereon is maintained at a temperature of 60.degree. C. or less by cooling the substrate, so that the Al layer is taperingly etched to form conductor lines having sloped sidewalls. The substrate is clamped to a cooled electrode stage by an electrostatic chuck.

REFERENCES:
patent: 4384918 (1983-05-01), Naomichi

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