Method of double patterning, method of processing a...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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C430S270100, C430S311000, C430S317000, C430S322000, C430S330000, C430S331000, C430S394000

Reexamination Certificate

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08043794

ABSTRACT:
A method of double patterning is disclosed. The method includes forming a first photosensitive layer; exposing the first photosensitive layer using a first reticle; developing the first photosensitive layer thereby forming a first image pattern including first elements; forming a second photosensitive layer; exposing the second photosensitive layer using the first reticle; and developing the second photosensitive layer thereby forming a second image pattern.

REFERENCES:
patent: 5686223 (1997-11-01), Cleeves
patent: 5741625 (1998-04-01), Bae et al.
patent: 5814834 (1998-09-01), Yamazaki et al.
patent: 6074900 (2000-06-01), Yamazaki et al.
patent: 6406834 (2002-06-01), Kuit et al.
patent: 6569605 (2003-05-01), Bae
patent: 6586754 (2003-07-01), Hultermans
patent: 6803178 (2004-10-01), Subramanian et al.
patent: 6998198 (2006-02-01), Lin et al.
patent: 7005215 (2006-02-01), Pierrat
patent: 7011936 (2006-03-01), Nolscher et al.
patent: 7033735 (2006-04-01), Ho et al.
patent: 7368225 (2008-05-01), Subramanian et al.
patent: 7566526 (2009-07-01), Yang
patent: 7582413 (2009-09-01), Chen
patent: 2005/0064343 (2005-03-01), Romanato et al.
patent: 2005/0208430 (2005-09-01), Colburn et al.
patent: 2006/0024621 (2006-02-01), Nölscher et al.
patent: 2006/0160028 (2006-07-01), Lee et al.
patent: 2006/0216649 (2006-09-01), Paxton et al.
patent: 2008/0153300 (2008-06-01), Bok
patent: 2008/0199814 (2008-08-01), Brzozowy et al.
patent: 2008/0305642 (2008-12-01), Lee et al.
Lee, S., et al., “Double exposure technology using silicon containing materials,” Advances in Resist Technology and Processing XXIII, edited by Qinghuang Lin, Mar. 2006, pp. 61531K-1-61531K-7, Proc. of SPIE, vol. 6153, SPIE.
Lim, C-M., et al., “Positive and Negative Tone Double Patterning Lithography for 50nm Flash Memory,” Optical Microlithography XIX, edited by Donis G. Flagello, Apr. 2006, pp. 615410-1-615410-8, Proc. of SPIE, vol. 6154, SPIE.
Vanleenhove, A., et al., “A litho-only approach to double patterning,” Optical Microlithography XX, edited by Donis G. Flagello, Mar. 2007, 10 pages, Proc. of SPIE, vol. 6520, SPIE.

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