Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2008-02-01
2011-10-25
Walke, Amanda C. (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S270100, C430S311000, C430S317000, C430S322000, C430S330000, C430S331000, C430S394000
Reexamination Certificate
active
08043794
ABSTRACT:
A method of double patterning is disclosed. The method includes forming a first photosensitive layer; exposing the first photosensitive layer using a first reticle; developing the first photosensitive layer thereby forming a first image pattern including first elements; forming a second photosensitive layer; exposing the second photosensitive layer using the first reticle; and developing the second photosensitive layer thereby forming a second image pattern.
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Chiu Yi-Ming
Noelscher Christoph
Wu Yuan-Hsun
Cozen O'Connor
Qimonda AG
Walke Amanda C.
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