Method of dividing circuit pattern, method of manufacturing...

Details Method of dividing circuit pattern, method of manufacturing... Method of dividing circuit pattern, method of manufacturing...

2007-02-20

2007-02-20

Lin, Sun James (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000

Reexamination Certificate

active

10948154

ABSTRACT:
A method of dividing a circuit pattern for creating complementary stencil masks corresponding to complementary patterns, the method comprising a step of dividing a circuit pattern into a plurality of complementary patterns including a first complementary pattern comprising a pattern of a cantilevered beam member having a support portion width W1and a length L1, and a second complementary pattern comprising a pattern of a both end-supported beam member having a support portion width W2and a length L2. The dividing of the circuit pattern is performed in a manner that a aspect ratio A1(L1/W1) of the pattern of the cantilevered beam member is confined to not more than 100, and that a aspect ratio A2(L2/W2) of the pattern of the both end-supported beam member is confined to not more than 150.

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