Method of developing presensitized offset printing plates and de

Details Method of developing presensitized offset printing plates and de Method of developing presensitized offset printing plates and de

1991-07-09

1993-08-10

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430302, 430309, 430325, G03C 500

Patent

active

052347966

ABSTRACT:
A developing solution of an imagewise exposed, presensitized offset printing plate is disclosed. The developing solution has a pH of at least 12.5, and contains a low content of a silicate in an amount of up to 1.0 wt % as SiO.sub.2, a surfactant in an amount of 0.01 to 10 wt %, an aromatic carboxylic acid in an amount of 0.1 to 10 wt %, and an amine compound represented by the following general formula (I) in an amount of 0.1 to 10 wt %:

REFERENCES:
patent: 4530895 (1985-07-01), Simon et al.
patent: 4579811 (1986-04-01), Schell et al.
patent: 5106724 (1992-04-01), Nogami et al.
Patent Abstracts of Japan, vol. 11, No. 395 (P-650) (2482) Dec. 24, 1987. "Developing Solution Composition for Photosensitive Lithographic Plate and Developing Method".

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