Method of developing a high contrast, positive photoresist using

Details Method of developing a high contrast, positive photoresist using Method of developing a high contrast, positive photoresist using

1987-04-06

1989-02-28

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430309, G03C 518

Patent

active

048085138

ABSTRACT:
Compositions and methods for developing quinone diazide positive-working photoresists. The compositions consist essentially of an aqueous solution of a tetraalkylammonium hydroxide primary alkali and an alkanolamine having the following structure: ##STR1## wherein n is zero or 1, and each R is independently selected from hydrogen, methyl, or ethyl. The methods involve use of this composition to develop the indicated photoresists. The addition of an alkanolamine of the indicated type prevents the formation of irregular deposits on the edges of unexposed portions of the photoresist lines when the photoresist is developed. Selection of these alkanolamines also increases the uniformity of line widths of photoresist lines developed according to the present invention, and increases the process latitude of the developer.

REFERENCES:
patent: 3984243 (1976-10-01), Shimimura et al.
patent: 4294911 (1981-10-01), Guild
patent: 4379830 (1983-04-01), Deutsch et al.
patent: 4411981 (1983-10-01), Minezaki
patent: 4464461 (1984-08-01), Guild
patent: 4530895 (1985-07-01), Simon et al.
patent: 4765844 (1988-08-01), Merrem et al.

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