Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems
Reexamination Certificate
2007-06-12
2007-06-12
Luu, Thanh X. (Department: 2878)
Radiant energy
Photocells; circuits and apparatus
Photocell controls its own optical systems
C356S512000, C355S068000
Reexamination Certificate
active
11387945
ABSTRACT:
A method of determining at least one optical property of a projection exposure system is described, wherein the exposure system includes a beam delivery system having a light source for generating an exposure optical beam having light of a first wavelength (λ1) and a second wavelength (λ2), wherein a first ratio is defined as an intensity of light λ2to an intensity of light λ1in the exposure optical beam. The method includes supplying at least one measuring optical beam including light of at least λ1to the projection optical system, detecting wavefronts having traversed the projection optical system, and determining an optical property in dependence of the detected wavefronts, wherein a second ratio of an intensity of light of λ2to an intensity of light of λ1in the measuring optical beam being incident on the detector of the wavefront detection system is less than the first ratio.
REFERENCES:
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5296892 (1994-03-01), Mori
patent: 5335059 (1994-08-01), Maruyuma et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5577092 (1996-11-01), Kublak et al.
patent: 5631721 (1997-05-01), Stanton et al.
patent: 5710620 (1998-01-01), Taniguchi
patent: 5724122 (1998-03-01), Oskotsky
patent: 5828455 (1998-10-01), Smith et al.
patent: 5926257 (1999-07-01), Mizouchi
patent: 6285443 (2001-09-01), Wangler et al.
patent: 6307682 (2001-10-01), Hoffman et al.
patent: 6344898 (2002-02-01), Gemma et al.
patent: 6661522 (2003-12-01), Ouchi
patent: 6829039 (2004-12-01), Endo et al.
patent: 2001/0055103 (2001-12-01), Nishi
patent: 2002/0001088 (2002-01-01), Wegmann et al.
patent: 2002/0159048 (2002-10-01), Inoue et al.
patent: 2003/0090627 (2003-05-01), Hirohara et al.
patent: 2003/0128368 (2003-07-01), Kuchel
patent: 2004/0095662 (2004-05-01), Masaki et al.
patent: 1387220 (2004-02-01), None
patent: WO 02/42728 (2002-05-01), None
Emer Wolfgang
Lauer Steffen
Sakowski Harald
Schriever Martin
Wegmann Ulrich
Carl Zeiss SMT AG
Jones Day
Luu Thanh X.
Yam Stephen
LandOfFree
Method of determining optical properties and projection... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of determining optical properties and projection..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of determining optical properties and projection... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3882374