Method of detecting heavy metal in semiconductor substrate

Semiconductor device manufacturing: process – With measuring or testing – Electrical characteristic sensed

Reexamination Certificate

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C257SE21531

Reexamination Certificate

active

07993942

ABSTRACT:
A method of detecting heavy metal in a semiconductor substrate, includes: a gate oxide film forming step of forming an organic oxide film by spin coating or a sol-gel process, and forming a metal/oxide film/semiconductor junction element by using a mercury probe method; and a step of detecting and quantifying heavy metal by calculating the surface concentration of the heavy metal from junction capacitance characteristics of the element.

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