Method of deposition of metal into cavities on a substrate

Details Method of deposition of metal into cavities on a substrate Method of deposition of metal into cavities on a substrate

1988-03-28

1989-10-17

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

156643, 2041923, 20419234, 437228, C23C 1446, H01L 2188

Patent

active

048744930

ABSTRACT:
A process for filling cavities in a flat surface on a substrate by metal deposition which includes depositing a film of metal onto the flat surface and cavities in a substantially perpendicular direction to the surface, and simultaneously re-sputtering and deposited film on the flat surface by ion beam milling at an angle to the surface of the substrate for achieving the deposition of metal into the cavities and filling the cavities without leaving any film on the flat surface.

REFERENCES:
patent: 3983022 (1976-09-01), Auyang et al.
patent: 4248688 (1981-02-01), Gartner et al.
patent: 4460434 (1984-07-01), Johnson et al.
patent: 4560577 (1985-12-01), Mirtich et al.
patent: 4714520 (1987-12-01), Gwozdz
patent: 4717462 (1988-01-01), Homma et al.
patent: 4721689 (1988-01-01), Chaloux, Jr. et al.
patent: 4756810 (1988-07-01), Lamont, Jr. et al.
Brian Chapman, Glow Discharge Processes, John Wiley & Sons, New York, 1980, pp. 272-275.

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