Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
1995-01-27
2002-02-12
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192120, C204S192150, C204S192220
Reexamination Certificate
active
06346176
ABSTRACT:
FIELD OF THE INVENTION
The invention is in the field of depositing thin films and, more particularly, relates to a method of depositing thin films by reactive sputtering followed by treatment with reactive ions as for example by a reactive ion beam, both performed in the same atmosphere comprising a mixture of reactive and inert gases.
BACKGROUND OF THE INVENTION
There are many instances, such as in optical applications, in which it is desirable to deposit an oxide film or coating on a substrate. Various methods are known in the prior art for depositing such coatings.
One method known to the prior art is depositing an oxide coating on a substrate by RF sputtering, in which a frequency of the order of 13.56 MHz is applied between the “anode” electrode and the target “cathode” in a highly oxidizing atmosphere.
Quasi Patent 4,693,805 discloses reactive sputtering in which positive DC pulses are applied between the anode and the target in the presence of oxygen. When the voltage difference between the anode and the target is zero, a negative DC voltage pulse is applied between the target and a secondary cathode to discharge oxide layers on the target and eliminate the problem of target arcing. The patentee indicates that low frequency power supplies may be used but always in an atmosphere having a sufficiently high oxygen content that only metal oxide is sputtered and no elemental metal.
SUMMARY OF THE INVENTION
One object of my invention is to provide a method of forming a thin oxide coating more rapidly than is possible in the prior art by sputtering both elemental metal and metal oxide.
Another object of my invention is to provide a method of sputtering a thin oxide coating on a substrate which allows close control of the coating applied.
A still further object of my invention is to provide a method of reactive sputtering at relatively low frequency.
Other and further objects of my invention will appear from the following description.
REFERENCES:
patent: 4693805 (1987-09-01), Quazi
patent: 4851095 (1989-07-01), Scobey et al.
patent: 4931169 (1990-06-01), Scherer et al.
patent: 5122252 (1992-06-01), Latz et al.
patent: 5292417 (1994-03-01), Kugler
Gentex Optics, Inc.
McDonald Rodney G.
Shenter & O'Connor
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