Method of depositing a layer

Details Method of depositing a layer Method of depositing a layer

2005-06-14

2005-06-14

Fourson, George (Department: 2823)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S685000, C438S688000

Reexamination Certificate

active

06905962

ABSTRACT:
This invention relates to a method of depositing a layer on an exposed surface of an insulating layer of material. The method includes treating the exposed surface with hydrogen or a gaseous source of hydrogen in the presence of a plasma, prior to or during deposition of a metallic layer.

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