Method of delay calculation for variation in interconnect...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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C716S030000, C703S019000

Reexamination Certificate

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06880142

ABSTRACT:
A method of calculating delay for a process variation includes finding a value for each of exactly two independent variables that results in a maximum or minimum variation of estimated cell delay plus net delay, calculating a variation of resistance from the value found for each of the exactly two independent variables, calculating a variation of capacitance from the value found for each of the exactly two independent variables, adding the calculated variation of resistance to a net resistance to generate a modified net resistance for a selected net, adding the calculated variation of capacitance to a net capacitance to generate a modified net capacitance for the selected net, and calculating the cell delay plus net delay from the modified net resistance and the modified net capacitance.

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