Method of defining a photoresist layer

Details Method of defining a photoresist layer Method of defining a photoresist layer

1979-09-12

1980-12-16

Newsome, John H.

Coating processes

Electrical product produced

Welding electrode

250492A, 430327, 430397, 430494, B05D 306

Patent

active

042397901

ABSTRACT:
The method entails vibrating the wafer during the exposure of the photoresist in order to eliminate standing waves which occur in layers parallel to the surface of the photoresist layer and which cause alternately exposed and unexposed layers of the photoresist to be present.

REFERENCES:
patent: 3716363 (1973-02-01), Ruggerio
patent: 3890148 (1975-06-01), Lawson et al.
patent: 3940274 (1976-02-01), MacAnally
patent: 4023904 (1977-05-01), Sheets
patent: 4066458 (1978-01-01), Stuckert
patent: 4070499 (1978-01-01), Ramler
patent: 4082453 (1978-05-01), Knop
patent: 4088896 (1978-05-01), Elkins et al.
patent: 4133702 (1979-01-01), Krimmel

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