Method of defect inspection

Details Method of defect inspection Method of defect inspection

2008-06-03

2008-06-03

Connolly, Patrick (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

Reexamination Certificate

active

07382451

ABSTRACT:
A plurality of cassettes, each having a plurality of wafers respectively having a first defect information, is selected. Each of the cassettes is then assigned to a corresponding tool having at least one reaction chamber, and the wafers are substantially equally assigned to the reaction chambers. A first process is then performed on each of the wafers in the reaction chamber. Finally, a first defect inspection process is performed on each of the wafers.

REFERENCES:
patent: 4886412 (1989-12-01), Wooding et al.
patent: 5847821 (1998-12-01), Tracy et al.
patent: 5909276 (1999-06-01), Kinney et al.
patent: 5966459 (1999-10-01), Chen et al.
patent: 5971586 (1999-10-01), Mori
patent: 6073501 (2000-06-01), Rohner
patent: 6341241 (2002-01-01), Mugibayashi et al.
patent: 6360133 (2002-03-01), Campbell et al.
patent: 6401088 (2002-06-01), Jagadish et al.
patent: 6763130 (2004-07-01), Somekh et al.
patent: 6975920 (2005-12-01), Kahn et al.
patent: 7196785 (2007-03-01), Nishiyama et al.
patent: 2002/0165636 (2002-11-01), Hasan
patent: 2007/0233404 (2007-10-01), Lally et al.

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