Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1987-10-30
1990-03-13
Dees, Jose
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430317, 430325, 430326, 430328, 156628, G03C 500
Patent
active
049082981
ABSTRACT:
A method is provided for creating multilayer patterned films wherein at least one layer is an etch-resistant patterned layer, and wherein either positive or negative tone patterns can be obtained.
The etch-resistant patterned layer is obtained by reacting a patterned polymeric film containing reactive functional groups with an organometallic reagent such as a silicon-containing compound. The pattern is subsequently transferred through adjacent polymeric layers using an oxygen plasma or equivalent dry-etch method.
REFERENCES:
patent: 3652274 (1972-03-01), Verelst et al.
patent: 4125650 (1978-11-01), Chiu et al.
patent: 4396704 (1983-08-01), Taylor
patent: 4426247 (1984-01-01), Tamamura et al.
patent: 4657845 (1987-04-01), Frechet et al.
patent: 4751170 (1988-06-01), Mimura et al.
G. N. Taylor Solid State Technology, vol. 27, No. 2, Feb. 1984, pp. 145-155.
T. M. Wolf et al., Journal of Electro Chemical Society, vol. 131, No. 7, Jul. 1984, pp. 1664-1670.
D. Follett et al., Extended Abstracts, vol. 82-2, Oct. 1982, pp. 321-322, Abstract No. 201.
Hefferon George J.
Ito Hiroshi
MacDonald Scott A.
Willson Carlton G.
Dees Jose
International Business Machines - Corporation
Stemwedel John A.
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