Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1985-11-26
1987-03-10
Demers, Arthur P.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
2041923, 20419233, 204298, C23C 1500
Patent
active
046489525
ABSTRACT:
The method and device for controlling the thermo chemical treatment of workpieces in slow discharge in a medium of treating gas, includes operating stages of warm-up with simultaneous intensive cathode sputtering, diffusion saturation, and cooling of treated workpieces. During each stage the workpiece temperature, the frequency of occurring arc discharges and the glow discharge voltage are measured and compared with preset values. Corresponding error signals and control signals are obtained and used to regulate the treated workpiece temperature and the arc discharge frequency using the discharge current value, and the glow discharge voltage using the flow rate value of one of at least two treating gases that enter the working chamber, a preset value of glow discharge voltage corresponding to each treating gas.
REFERENCES:
patent: 4313783 (1982-02-01), Davies et al.
patent: 4396478 (1983-08-01), Aizenshtein et al.
patent: 4500408 (1985-02-01), Boys et al.
patent: 4533449 (1985-08-01), Levenstein
Chandler et al., Thin Solid Films 86(1981), pp. 183-191.
Mintchev Mintcho S.
Nitchev Peter T.
Savov Svetoslav A.
Shivarov Georgi S.
Demers Arthur P.
Dubno Herbert
Ross Karl F.
Vmei "Lenin"
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