Method of controlling process parameters for semiconductor...

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

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C700S037000, C700S042000, C700S120000, C700S300000, C219S121580

Reexamination Certificate

active

07848840

ABSTRACT:
Methods and systems for adaptively controlling process parameters in semiconductor manufacturing equipment. An embodiment provides for gain scheduling of PID controllers across recipe steps. One embodiment provides a method for controlling a chuck temperature during a semiconductor manufacturing process, the method employing a first set of proportional-integral-derivative (PID) values in a PID controller to control the chuck temperature at a first setpoint in a first step of a process recipe and employing a second set of PID values in the PID controller to control the chuck temperature at a second setpoint, different than the first setpoint, in a second step of the process recipe. The methods and systems provide reduced controller response times where process parameter setpoint between steps of a process recipe span a wide range.

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Oakleef Engineering, “BeyondPID Controller”, 1999, pp. 1-23.
Oakleef Engineering, “Multizone Control Challenges and Solutions”, 1999, pp. 1-4.

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