Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1997-07-02
1999-09-07
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429805, 20429803, 20429806, 20429841, 156345, 118723E, 118723VE, C23C 1454, C23C 1434, C23C 1432
Patent
active
059482249
ABSTRACT:
A vacuum treatment apparatus eliminate arcing in a vacuum recipient for containing an atmosphere and having a mechanism for generating electrical charge carriers in the atmosphere. A workpiece carrier arrangement and at least two electro-conductive surfaces are in the recipient and a generator unit having an output is connected to the electro-conductive surfaces. The generator includes a DC generator with an output, and a controlled adjusting unit with an input connected to the output of the DC generator. The controlled adjusting unit generates a first output signal in dependency on an output signal of the DC generator during first timespans, and a second output signal during second timespans. The unit may also have a time-controlled discharge or charge current loop connected from one of the electro-conductive surfaces to the other, with a higher ohmic resistance during the first timespans and a lower ohmic resistance during the second timespans.
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Haag Walter
Kugler Eduard
Rudigier Helmut
Signer Hans
Wellerdieck Klaus
Balzers Aktiengsellschaft
McDonald Rodney G.
Nguyen Nam
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