Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2007-02-13
2007-02-13
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C716S030000
Reexamination Certificate
active
10708055
ABSTRACT:
A method of designing a layout of an alternating phase shifting mask for projecting an image of an integrated circuit design having a plurality of features to be projected using alternating phase shifting segments, including a gate-shrink region of a transistor having a critical width along a length thereof that extends beyond a diffusion region. The method also provides alternating phase shift design rules based on alternating phase shift design parameters comprising minimum phase width, minimum phase-to-phase spacing, and minimum extension of critical width beyond another feature. The method then includes identifying portions of the integrated circuit layout having a critical width feature that violate the alternating phase shift design rules, and reducing the length that the critical width gate-shrink region feature extends beyond the other diffusion region feature to the minimum extension. An alternating phase shifting mask layout is then generated in conformance with the alternating phase shift design rules.
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“Alternating Phase Shifted Mask for Logic Gate Levels, Design and Mask Manufacturing”, Lars Liebmann, Ioana Graur, William Liepold, James Oberschmidt, David O'Grady and Denis Riegaill, IBM Microelectronics, 12 pages.
“Alternating Phase Shifted Mask for Logic Gate Levels, Design and Mask Manufacturing”, Lars Liebmann, Ioana Graur, William Leipold, James Oberschmidt, David O'Grady, Denis Regaill; IBM Microelectronics, East Fishkill, New York and Burlington, Vermont. SPIE Conference on Optical Microlithography XII, Mar. 1999, vol. 3679, pp. 27-37.
Graur Ioana
Liebmann Lars W.
C. Li Todd M.
DeLio & Peterson LLC
Peterson Peter W.
Rosasco S.
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