Method of cleaning reaction chamber, method of forming...

Details Method of cleaning reaction chamber, method of forming... Method of cleaning reaction chamber, method of forming...

2006-09-26

2010-06-08

Meeks, Timothy H (Department: 1792)

Coating processes

Interior of hollow article coating

C427S248100, C134S022100

Reexamination Certificate

active

07732009

ABSTRACT:
A method of cleaning a reaction chamber having a wafer holder is provided. First, the reaction chamber is cleaned by a cleaning gas. Next, a protection film is formed on the inner surface of the reaction chamber, wherein a gap is formed between the protection wafer and the wafer holder, and a cooling gas is guided therebetween simultaneously.

REFERENCES:
patent: 5589003 (1996-12-01), Zhao et al.
patent: 6828241 (2004-12-01), Kholodenko et al.
patent: 2001/0046768 (2001-11-01), Mezey, Sr.
patent: 2003/0029563 (2003-02-01), Kaushal et al.
patent: 2003/0180459 (2003-09-01), Redeker et al.
patent: 2005/0214455 (2005-09-01), Li et al.
patent: 2006/0130758 (2006-06-01), Lohokare et al.
patent: 2004247404 (2004-09-01), None

Affiliated with

Also associated with

Rating

Method of cleaning reaction chamber, method of forming... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of cleaning reaction chamber, method of forming..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of cleaning reaction chamber, method of forming... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4230114