Method of cleaning of an electrostatic chuck in plasma reactors

Details Method of cleaning of an electrostatic chuck in plasma reactors Method of cleaning of an electrostatic chuck in plasma reactors

1994-06-03

1996-04-16

Breneman, R. Bruce

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

437949, 437946, 118723R, 118723VE, 134 7, C23C 1600

Patent

active

055078745

ABSTRACT:
The present invention provides a method for removing particulate contaminants from an electrostatic chuck pedestal for a semiconductor workpiece by physical removal employing a soft material workpiece or by creating a plasma sheath which suspends the contaminants from the chuck surface and entrains them in the gas stream of the chamber vacuum exhaust system of the chamber. The contaminant removal processes are particularly effective in continuous plasma processes for the treatment of workpieces.

REFERENCES:
patent: 5166856 (1992-11-01), Liporace et al.
patent: 5191506 (1993-03-01), Logan et al.
patent: 5207437 (1993-05-01), Barnes et al.
patent: 5298720 (1994-03-01), Cuomo et al.
patent: 5382311 (1995-01-01), Ishikawa et al.

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