Method of cleaning of an electrostatic chuck in plasma reactors

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437949, 437946, 118723R, 118723VE, 134 7, C23C 1600

Patent

active

055078745

ABSTRACT:
The present invention provides a method for removing particulate contaminants from an electrostatic chuck pedestal for a semiconductor workpiece by physical removal employing a soft material workpiece or by creating a plasma sheath which suspends the contaminants from the chuck surface and entrains them in the gas stream of the chamber vacuum exhaust system of the chamber. The contaminant removal processes are particularly effective in continuous plasma processes for the treatment of workpieces.

REFERENCES:
patent: 5166856 (1992-11-01), Liporace et al.
patent: 5191506 (1993-03-01), Logan et al.
patent: 5207437 (1993-05-01), Barnes et al.
patent: 5298720 (1994-03-01), Cuomo et al.
patent: 5382311 (1995-01-01), Ishikawa et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of cleaning of an electrostatic chuck in plasma reactors does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of cleaning of an electrostatic chuck in plasma reactors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of cleaning of an electrostatic chuck in plasma reactors will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-322533

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.