Method of cleaning CVD cold-wall chamber and exhaust lines

Details Method of cleaning CVD cold-wall chamber and exhaust lines Method of cleaning CVD cold-wall chamber and exhaust lines

1998-01-13

2000-03-28

Warden, Jill

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 21, C03C 2300, B08B 504

Patent

active

060426543

ABSTRACT:
A method of cleaning post deposition deposits from a processing chamber by providing a chlorine gas (Cl.sub.2), forming chlorine radicals and reacting the chlorine radicals with the deposits.

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patent: 5756400 (1998-05-01), Ye et al.
patent: 5788778 (1998-08-01), Shang et al.
patent: 5788799 (1998-08-01), Steger et al.
patent: 5817534 (1998-10-01), Ye et al.
patent: 5843239 (1998-12-01), Shrotriya
patent: 5849092 (1998-12-01), Xi et al.

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