Cleaning and liquid contact with solids – Processes – Including use of vacuum – suction – or inert atmosphere
Reexamination Certificate
2007-12-11
2007-12-11
Kornakov, M. (Department: 1746)
Cleaning and liquid contact with solids
Processes
Including use of vacuum, suction, or inert atmosphere
C134S001000, C134S019000, C134S006000, C134S007000, C134S025400, C134S042000, C034S282000, C034S359000, C034S361000, C034S363000, C034S364000, C034S365000, C034S397000, C034S401000, C034S402000, C034S403000, C034S406000, C034S409000
Reexamination Certificate
active
10658800
ABSTRACT:
A lithographic mask is placed in a chamber which is then sealed. The gas pressure in the chamber is reduced to dislodge contaminant particles on the mask surface.
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English Translation of Japanese Office Action issued in Japanese Patent Application No. 2003-321110 dated Jan. 20, 2006.
English Translation of Japanese Office Action issued in Japanese Patent Application No. 2003-321110 mailed May. 9, 2006.
ASML Netherlands B.V.
Kornakov M.
Pillsbury Winthrop Shaw & Pittman LLP
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