Method of cleaning a quartz part

Details Method of cleaning a quartz part Method of cleaning a quartz part

2011-07-26

2011-07-26

Webb, Gregory E (Department: 1761)

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

C134S002000, C510S175000

Reexamination Certificate

active

07985297

ABSTRACT:
A cleaning solution for a quartz part and a method for cleaning the quartz part are provided. The cleaning solution includes from about 5 to about 35 wt % of an ammonium compound, from about 7 to about 55 wt % of an acidic oxidizing agent, from about 5 to about 30 wt % of a fluorine compound and a remaining amount of water. Residual thin films and impurities on the surface of the quartz part may be removed while reducing the damage onto the quartz part.

REFERENCES:
patent: 5259888 (1993-11-01), McCoy
patent: 5409569 (1995-04-01), Seki et al.
patent: 5560857 (1996-10-01), Sakon et al.
patent: 6284721 (2001-09-01), Lee
patent: 6431186 (2002-08-01), Morita et al.
patent: 7135445 (2006-11-01), Charm et al.
patent: 7250114 (2007-07-01), Kiehlbauch et al.
patent: 2002/0037654 (2002-03-01), Hayashi et al.
patent: 2002/0078710 (2002-06-01), Takeuchi et al.
patent: 2005/0274396 (2005-12-01), Shih et al.
patent: 2007/0203041 (2007-08-01), Lee
patent: 2008153271 (2008-07-01), None
patent: 1020060102244 (2006-09-01), None

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