Method of clean up of a patterned metal layer

Details Method of clean up of a patterned metal layer Method of clean up of a patterned metal layer

1995-06-07

1996-04-09

Fourson, George

Fishing, trapping, and vermin destroying

1566461, 1566561, 437245, H01L 21306

Patent

active

055061710

ABSTRACT:
A method of fabricating deformable mirror devices, or any other device, in which a metal pattern is to be etched over a photoresist layer. The method includes removal of a contaminating layer (11) that occurs as a result of the metal etch. This removal is accomplished at the wafer level, with an anhydrous hydrofluoric etch followed by a wet rinse.

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