Method of catalytic etching

Details Method of catalytic etching Method of catalytic etching

1983-05-10

1985-03-19

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430313, 430323, 156628, 156643, 156646, 427 431, G03C 500

Patent

active

045060053

ABSTRACT:
Catalytic etching is carried out by placing a pattern of a catalyst on a surface to be selectively etched and treating the imaged surface with an activated fluid which consumes the material being etched. In one embodiment a surface such as a chalcogenide is provided with a silver or other metal pattern corresponding to a semiconductor pattern and the chalcogenide is etched with an oxygen containing plasma reactive with the chalcogenide, the reaction being increased by the silver to provide a positive resist.

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patent: 4252891 (1981-02-01), Kostyshin et al.
patent: 4320191 (1982-03-01), Yoshikawa et al.
patent: 4368099 (1983-01-01), Huggett et al.
patent: 4371608 (1983-02-01), Das
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patent: 4434217 (1984-02-01), Masters et al.
patent: 4454221 (1984-06-01), Chen et al.
Yoshikawa et al., "A Novel Inorganic Photoresist Utilizing Ag Photodoping in Se-Ge Glass Films", Applied Physics Letters, vol. 29(10), 1976, pp. 677-679.
J. W. Coburn, "Plasma Etching and Reactive Ion Etching", AVS Monograph Series Article, pp. 38 and 40, (1982).

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