Method of calibrating WEE exposure tool

Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing

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430 30, G03F 900

Patent

active

060429763

ABSTRACT:
The invention provides four sub-patterns located at the periphery of the wafer surface at 90-degree intervals. Each of the four sub-patterns is divided into four alignment scales where each alignment scale is yet again subdivided into a multiplicity of alignment marks. This multiplicity of sub-patterns and alignment scales with each scale having a multiplicity of alignment marks results in very accurate and convenient alignment capability.

REFERENCES:
patent: 5545570 (1996-08-01), Chung et al.
patent: 5699282 (1997-12-01), Allen et al.
patent: 5723385 (1998-03-01), Shen et al.
patent: 5824457 (1998-10-01), Liu et al.

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